This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Innovations of Zabra H Amini
Introduction
Zabra H Amini is an accomplished inventor based in Cupertino, CA. He is known for his significant contributions to the field of semiconductor manufacturing. His innovative work has led to the development of a unique apparatus that enhances the efficiency of etching processes.
Latest Patents
Zabra H Amini holds a patent for a "Near substrate reactant homogenization apparatus." This invention is designed to reduce excess reactive species in the region at or near the edge of a substrate surface. By providing a uniform reactant concentration over the substrate, it improves etch rate uniformity. The apparatus features a substantially planar surface that is parallel to the substrate surface and extends beyond the substrate edge. In one embodiment, the temperature of the gas absorber area is adjusted to promote the recombination or condensation of excess reactive species. Another embodiment utilizes a porous material with a large surface area to capture excess reactive species. Additionally, a gas curtain of a laminar inert or reactive gas can be employed to suppress the flux of excess reactive species at the substrate's edge.
Career Highlights
Zabra H Amini is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has been instrumental in advancing technologies that enhance manufacturing processes. With a focus on innovation, he continues to contribute to the field through his research and development efforts.
Collaborations
Zabra has collaborated with notable colleagues, including Robert B Campbell and Robert L Jarecki, Jr. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise.
Conclusion
Zabra H Amini's innovative contributions to semiconductor technology exemplify the impact of dedicated inventors in the industry. His patent for the near substrate reactant homogenization apparatus showcases his commitment to improving manufacturing processes. Through his work at Applied Materials, Inc., he continues to drive advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
