Company Filing History:
Years Active: 2021
Title: Yves Lodewijk Maria Creijghton: Innovator in Optical Technology
Introduction
Yves Lodewijk Maria Creijghton is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of optical technology, particularly in the area of contamination removal from optical surfaces.
Latest Patents
Creijghton holds a patent for a "Method for removing a contamination layer by an atomic layer etching process." This innovative method involves at least partially removing a contamination layer from the optical surface of an optical element that reflects extreme ultraviolet (EUV) radiation. The process includes exposing the contamination layer to a surface-modifying reactant in a surface modification step, followed by exposure to a material-detaching reactant in a material detachment step. This method is particularly relevant for optical elements used in EUV lithography systems, where contamination layers are formed due to exposure to EUV radiation.
Career Highlights
Creijghton is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography technology. His work focuses on enhancing the performance and reliability of optical elements used in advanced lithography applications.
Collaborations
Throughout his career, Creijghton has collaborated with esteemed colleagues such as Fred Roozeboom and Dirk Heinrich Ehm. These collaborations have contributed to the advancement of optical technologies and the development of innovative solutions in the industry.
Conclusion
Yves Lodewijk Maria Creijghton is a prominent figure in the field of optical technology, with a focus on improving the efficiency of optical elements through innovative methods. His contributions continue to impact the industry positively.