Yuzuru Miura

Title: Yuzuru Miura: Innovator in Deposition Technology

Introduction

Yuzuru Miura is a notable inventor based in Tama, Japan. He has made significant contributions to the field of deposition technology, holding two patents that showcase his innovative approaches. His work primarily focuses on methods and apparatuses for film deposition using arc discharge techniques.

Latest Patents

One of Miura's latest patents is a deposition method and apparatus that involves arranging a discharge portion of a striker near a target to induce arc discharge. This method allows for the formation of a film on a substrate using plasma generated by the arc discharge. The process includes a changing step for adjusting the position of the striker, a deposition step for forming the film, and a reduction step that modifies the region based on the target's use.

Another significant patent is a vacuum arc deposition apparatus designed for forming a ta-C film on a substrate. This apparatus features a holding unit for the target unit, an anode unit for electron flow, and a power supply that generates plasma through arc discharge. The power supply utilizes a combination of DC and pulse current to enhance the arc discharge process.

Career Highlights

Yuzuru Miura is currently associated with Canon Anelva Corporation, where he continues to develop innovative technologies in the field of deposition. His expertise and contributions have positioned him as a key figure in advancing deposition methods.

Collaborations

Miura has collaborated with notable colleagues such as Hiroshi Yakushiji and Masahiro Shibamoto. Their combined efforts have furthered research and development in deposition technologies.

Conclusion

Yuzuru Miura's work in deposition technology exemplifies innovation and dedication to advancing the field. His patents reflect a deep understanding of arc discharge methods and their applications in film formation. His contributions continue to influence the industry and inspire future advancements.