The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
Jun. 24, 2020
Applicant:
Canon Anelva Corporation, Kawasaki, JP;
Inventors:
Assignee:
CANON ANELVA CORPORATION, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/32 (2006.01); C23C 14/54 (2006.01); H01J 37/34 (2006.01); C23C 14/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32055 (2013.01); C23C 14/325 (2013.01); C23C 14/505 (2013.01); C23C 14/54 (2013.01); H01J 37/3417 (2013.01);
Abstract
A deposition method of arranging a discharge portion of a striker near a target to induce arc discharge and forming a film on a substrate using a plasma generated by the arc discharge is disclosed. The method includes a changing step of changing a position for inducing the arc discharge by the striker in a region set in the target, a deposition step of forming the film on the substrate using the plasma generated by inducing the arc discharge at the position, and a reduction step of reducing the region in accordance with use of the target.