Hyogo, Japan

Yuya Ochii

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Hiroshima Metal & Machinery Co., Ltd., Shionogi Company Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuya Ochii. Retrieved from https://idiyas.com/inventor/yuya-ochii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yuya Ochii: Innovator in Nanoparticle Technology

Introduction

Yuya Ochii is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of nanoparticle technology, particularly through his innovative patent that addresses contamination issues in the grinding process.

Latest Patents

Ochii holds a patent for a "Nanoparticle composition with reduced contaminant and production method thereof." This patent outlines a method for producing nanoparticles that involves agitating a mixture containing a material to be ground, beads, and a dispersion medium in a bead mill. Additionally, the method includes a step of adjusting the pH of the mixture. This innovative approach effectively reduces contamination caused by the grinding process using a bead mill.

Career Highlights

Throughout his career, Yuya Ochii has worked with prominent companies, including Shionogi & Company Limited and Hiroshima Metal & Machinery Co., Ltd. His experience in these organizations has contributed to his expertise in nanoparticle technology and production methods.

Collaborations

Ochii has collaborated with notable coworkers such as Hironori Tanaka and Tetsuharu Ibaraki. Their combined efforts have further advanced the research and development in the field of nanoparticle applications.

Conclusion

Yuya Ochii's innovative work in nanoparticle technology showcases his commitment to reducing contamination in production processes. His contributions are significant in advancing the field and improving manufacturing techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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