Yuya Mutsuda

Title: Yuya Mutsuda: Innovator in Sputtering Technology

Introduction

Yuya Mutsuda is a notable inventor based in Sanda, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets. His innovative work has led to the creation of a patented technology that enhances the efficiency and effectiveness of sputtering processes.

Latest Patents

Mutsuda holds a patent for a sputtering target and method for producing a sputtering target. The invention provides a sputtering target with a composition containing 45 at % to 90 at % of indium (In), with the remainder including copper (Cu) and inevitable impurities. The patent describes the existence of an In single phase and a CuIn compound phase, with an XRD peak ratio I(In)/I(CuIn) between the two phases ranging from 0.01 to 3. Additionally, the average grain size of the CuIn compound phase is 150 µm or less, the amount of oxygen is 500 mass ppm or less, and the theoretical density ratio is 85% or more.

Career Highlights

Throughout his career, Yuya Mutsuda has worked with prominent companies in the industry. He has been associated with Mitsubishi Materials Corporation and Solar Frontier K.K., where he has applied his expertise in materials science to advance technology in sputtering applications.

Collaborations

Mutsuda has collaborated with talented individuals in his field, including Keita Umemoto and Shoubin Zhang. These collaborations have contributed to the development and refinement of his innovative technologies.

Conclusion

Yuya Mutsuda's contributions to sputtering technology through his patent and collaborations highlight his role as an influential inventor in the materials science sector. His work continues to impact the industry positively.