Osaka, Japan

Yuya Fujiki

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Nipro Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuya Fujiki. Retrieved from https://idiyas.com/inventor/yuya-fujiki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yuya Fujiki: Inventor of a Double-Lumen Catheter

Introduction

Yuya Fujiki is an inventor based in Osaka, Japan. His patent work includes a medical-device design for a double-lumen catheter. Fujiki is associated with Nipro Corporation.

Latest Patents

Fujiki is credited with 1 patent, titled “Double-Lumen Catheter.” The invention describes a catheter with a circumferential wall forming a lumen that extends from its proximal end to its distal end. A partition divides the lumen lengthwise into first and second passages, whose distal ends align with each other. The partition also has a U-shaped projection that extends beyond the distal end of the circumferential wall. At the distal end, the first passage includes a slit formed by cutting away part of the wall near its circumferential center.

Career Highlights

Fujiki’s listed patent reflects work on catheter structure and the arrangement of passages at the device’s distal end. His association with Nipro Corporation connects his invention to a company active in medical technology.

Collaborations

Shota Nakai and Yusuke Matsuda are identified as Fujiki’s coworkers. The available information does not specify their roles in the patent or whether they collaborated on the invention.

Conclusion

Yuya Fujiki’s patent record highlights a double-lumen catheter design with a divided lumen and a projecting partition, linking his inventive work to Nipro Corporation and medical-device technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…