Sant Cugat del Vallès, Spain

Yuval Eckstein

This inventor holds 1 USPTO granted patent. Top assignee: Peridot Print LLC. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuval Eckstein. Retrieved from https://idiyas.com/inventor/yuval-eckstein-44zol5cn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yuval Eckstein: Innovator in Print Technology

Introduction

Yuval Eckstein is a notable inventor based in Sant Cugat del Vallès, Spain. He has made significant contributions to the field of print technology, particularly in methods that enhance the quality of printed objects. His innovative approach addresses common challenges faced in the printing industry.

Latest Patents

Yuval Eckstein holds a patent for a method titled "Modifying print data near and/or at overlap areas between printhead dies." This invention focuses on reducing artifacts in printed objects by modifying print data at the overlap areas between adjacent printhead dies. The method compensates for drop placement, ensuring higher quality prints.

Career Highlights

Eckstein's career is marked by his dedication to improving printing technologies. His work at Peridot Print LLC has positioned him as a key player in the industry. With a focus on innovation, he continues to explore new methods that enhance print quality and efficiency.

Collaborations

Yuval has collaborated with talented individuals such as Luis Garcia Garcia and Adrien Chiron. These partnerships have fostered a creative environment that encourages the development of cutting-edge printing solutions.

Conclusion

Yuval Eckstein's contributions to print technology exemplify the impact of innovation in enhancing product quality. His patent and collaborative efforts reflect a commitment to advancing the printing industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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