Raanana, Israel

Yuval Dorphan


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: **Innovator Yuval Dorphan: Pioneering Wafer Inspection Technology**

Introduction

Yuval Dorphan, an inventive mind located in Raanana, Israel, has made significant strides in the field of semiconductor technology. With one patent to his name, Dorphan's contributions are shaping the way wafers are inspected, enhancing the reliability and efficiency of the manufacturing process.

Latest Patents

Dorphan's notable patent is titled "Method and apparatus for detecting defects in wafers including alignment of the wafer images so as to induce the same smear in all images". This innovation involves a comprehensive approach to inspecting wafers that contain a multiplicity of dies. By dividing an image of a portion of the wafer into multiple sub-images, Dorphan's method identifies defect candidates within each sub-image through precise comparisons to a reference representation assumed to be faultless. This process ultimately leads to improved accuracy in defect detection, crucial for high-quality semiconductor production.

Career Highlights

Currently, Yuval Dorphan is associated with Applied Materials South East Asia Pte. Ltd., a leading company in the semiconductor equipment space. His role at the company allows him to focus on innovative solutions in wafer inspection, where his expertise contributes significantly to advancements in the industry.

Collaborations

Throughout his career, Dorphan has collaborated with notable coworkers such as Ran Zaslavsky and Mark Wagner. These partnerships have led to shared insights and knowledge that bolster the innovative processes within their projects, promoting a culture of collaboration and excellence in technology development.

Conclusion

With his innovative patent and significant role at Applied Materials, Yuval Dorphan stands out as a prominent figure in semiconductor technology. His work not only addresses the pressing challenges of wafer inspection but also sets new standards for accuracy and efficiency in the industry.

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