This inventor holds 3 USPTO granted patents. Top assignees: Kabushiki Kaisha Toshiba, Tokyo Shibaura Denki Kabushiki Kaisha. Active years: 1982-1990.
Location History:
- Chigasaki, JP (1982 - 1989)
- Tokyo, JP (1990)
Company Filing History:


Years Active: 1982-1990
Title: Yuusuke Wada: Innovator in Solder Resist Ink Compositions
Introduction
Yuusuke Wada is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of solder resist ink compositions, holding a total of 3 patents. His innovative work has implications for various applications in electronics and materials science.
Latest Patents
Wada's latest patents include a solder resist ink composition that features a photo-curable resin. This resin is created by reacting an unsaturated monocarboxylic acid with a cresolnovolak- or phenolnovolak-type epoxy resin. Additionally, a polybasic carboxylic anhydride is reacted with the resultant product. The composition also includes at least one photo-polymerizable compound, a photo-polymerization initiator, an organic solvent, and an inorganic filler. Furthermore, he has disclosed two other solder resist ink compositions, each containing a different photo-curable component. Another significant patent involves photocurable compositions that comprise various innovative materials.
Career Highlights
Throughout his career, Yuusuke Wada has worked with prominent companies such as Kabushiki Kaisha Toshiba and Tokyo Shibaura Denki Kabushiki Kaisha. His experience in these organizations has allowed him to develop and refine his expertise in the field of materials science and engineering.
Collaborations
Wada has collaborated with notable colleagues, including Moriyasu Wada and Shuichi Suzuki. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Yuusuke Wada's contributions to solder resist ink compositions and photocurable materials highlight his innovative spirit and dedication to advancing technology. His work continues to influence the field and inspire future developments in materials science.