This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Jsr Corporation. Active years: 2014.
Company Filing History:
Years Active: 2014
Title: Yuusuke Anno: Innovator in Pattern Formation Technology
Introduction
Yuusuke Anno is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of pattern formation technology, particularly through his innovative patent. His work is essential in advancing the capabilities of radiation-sensitive resin compositions.
Latest Patents
Yuusuke Anno holds a patent for a "Method for forming pattern." This method involves providing a first positive-working radiation-sensitive resin composition on a substrate to create a first resist layer. The composition includes a crosslinking agent, a polymer with an acid-unstable group, a radiation-sensitive acid generator, and a solvent. The first resist layer is selectively exposed to radiation and developed to form a first resist pattern. This pattern is then made inactive to radiation or insolubilized in an alkaline developer or in a second positive-working radiation-sensitive resin composition. The second composition is applied to form a second resist layer, which is also selectively exposed and developed to create a second resist pattern in the area of the first resist pattern. Yuusuke Anno's patent represents a significant advancement in the field of photolithography.
Career Highlights
Yuusuke Anno has dedicated his career to research and development in the field of materials science. His innovative approach to pattern formation has garnered attention and respect within the industry. He is associated with JSR Corporation, a leading company in the development of advanced materials.
Collaborations
Yuusuke Anno has collaborated with notable colleagues, including Yukio Nishimura and Kaori Sakai. These collaborations have further enhanced his research and contributed to the success of his projects.
Conclusion
Yuusuke Anno is a key figure in the field of pattern formation technology, with a valuable patent that showcases his innovative spirit. His work continues to influence advancements in materials science and photolithography.