Kameyama, Japan

Yuuki Ootsuka

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Sharp Display Technology Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuuki Ootsuka. Retrieved from https://idiyas.com/inventor/yuuki-ootsuka-natii6dz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Yuuki Ootsuka

Introduction

Yuuki Ootsuka is a notable inventor based in Kameyama, Japan. He has made significant contributions to the field of detection technology. His work is characterized by a focus on enhancing the efficiency and functionality of detectors.

Latest Patents

Ootsuka holds a patent for a detector that includes a first electrode and a second electrode facing each other, creating a flow path for charged particles. This innovative design allows for the detection of objects between the electrodes. The detector also features a third electrode positioned downstream to collect the charged particles. A potential supply circuit is integrated into the design, which includes inductors connected to a DC power supply, enhancing the detector's performance. He has 1 patent to his name.

Career Highlights

Yuuki Ootsuka is currently associated with Sharp Display Technology Corporation, where he continues to develop cutting-edge technologies. His work at the company has been instrumental in advancing the capabilities of display technologies.

Collaborations

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Conclusion

Yuuki Ootsuka's innovative work in detection technology exemplifies the impact of dedicated inventors in advancing modern technology. His contributions continue to influence the field significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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