Company Filing History:
Years Active: 2024
Title: Yuto Hakamata: Innovator in Semiconductor Technology
Introduction
Yuto Hakamata is a prominent inventor based in Aichi, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative designs and patents. His work has had a notable impact on the industry, showcasing his expertise and creativity.
Latest Patents
Hakamata holds a patent for a semiconductor integrated circuit. This invention includes a substrate of a first conductivity type, a buried insulating film provided on the substrate, and an active layer of the first conductivity type situated on the buried insulating film. Additionally, it features a first impurity region of a second conductivity type formed within the active layer, an electric field relaxation layer of the second conductivity type surrounding the first impurity region, and a second impurity region of the first conductivity type surrounding the electric field relaxation layer. The design also incorporates a groove surrounding the second impurity region that reaches the buried insulating film. This patent exemplifies Hakamata's innovative approach to semiconductor design.
Career Highlights
Yuto Hakamata is associated with Kabushiki Kaisha Tokai Rika Denki Seisakusho, a company known for its advancements in electronic components and systems. His role at the company has allowed him to further develop his ideas and contribute to cutting-edge technology in the semiconductor field.
Collaborations
Hakamata has worked alongside talented colleagues such as Kengo Shima and Yoshikazu Kataoka. Their collaborative efforts have fostered an environment of innovation and creativity, leading to advancements in their respective projects.
Conclusion
Yuto Hakamata is a distinguished inventor whose work in semiconductor technology has made a significant impact. His innovative patent and collaboration with skilled professionals highlight his contributions to the field. Hakamata's dedication to advancing technology continues to inspire future innovations.