Otsu, Japan

Yutaro Koyama

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Yutaro Koyama: Innovator in Alkali-Soluble Resins

Introduction

Yutaro Koyama is a notable inventor based in Otsu, Japan. He has made significant contributions to the field of materials science, particularly in the development of alkali-soluble resins and photosensitive resin compositions. With a total of 2 patents, Koyama's work has implications for various electronic components and semiconductor devices.

Latest Patents

Koyama's latest patents include innovations such as an alkali-soluble resin, a photosensitive resin composition, and a production method for relief patterns of cured films. His inventions focus on creating a cured film that exhibits high extensibility, reduced stress, and excellent adhesion to metals, particularly copper. The alkali-soluble resin he developed includes a specific structure that enhances its properties, making it suitable for advanced applications in electronics.

Career Highlights

Yutaro Koyama is currently employed at Toray Industries, Inc., where he continues to push the boundaries of material innovation. His work has been instrumental in advancing the capabilities of photosensitive materials, which are crucial for modern semiconductor manufacturing.

Collaborations

Koyama has collaborated with notable colleagues such as Yuki Masuda and Masao Tomikawa. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in the field of materials science.

Conclusion

Yutaro Koyama's contributions to the field of alkali-soluble resins and photosensitive materials highlight his role as an innovator in the industry. His patents reflect a commitment to enhancing the performance of materials used in electronic applications.

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