Location History:
- Sunnyvale, CA (US) (2001 - 2002)
- Fremont, CA (US) (2003 - 2010)
Company Filing History:
Years Active: 2001-2010
Title: Innovator Spotlight: Yutao Ma and Her Contributions to CMP Technology
Introduction: Yutao Ma is a distinguished inventor based in Fremont, California, recognized for her significant contributions to the field of chemical mechanical planarization (CMP). With a robust portfolio of five patents, she has demonstrated her innovative prowess in developing technologies that enhance substrate polishing processes in semiconductor manufacturing.
Latest Patents: Among her latest patents is the "Pad Conditioner," which provides a novel solution for conditioning polishing pads in CMP. This invention features a plastic abrasive portion with a specific hardness, along with an optional brush portion designed for optimal contact with polishing pads. The unique design includes a base plate and numerous plastic nodules, ensuring effective surface treatment during the polishing process. Additionally, Yutao has developed a "Method and Apparatus for Hard Pad Polishing," which presents a systematic approach for planarizing substrates containing copper materials. This patent outlines a cohesive system of three platens, each designated for sequential polishing steps that efficiently remove various copper layers, culminating in a barrier layer removal.
Career Highlights: Yutao Ma has made remarkable strides in her career at Applied Materials, Inc., a leading company in the semiconductor manufacturing industry. Her innovative solutions have contributed to the advancement of CMP technology, significantly improving the efficiency and effectiveness of substrate processing.
Collaborations: Yutao has had the opportunity to collaborate with esteemed colleagues, including Rajeev Bajaj and Fred Conrad Redeker. These partnerships have fostered an environment of creativity and innovation, allowing for the development of cutting-edge technologies in the realm of semiconductor processing.
Conclusion: Yutao Ma stands as a notable figure in the innovation landscape of chemical mechanical planarization. Through her patents and collaborative efforts, she continues to influence the trajectory of semiconductor manufacturing, paving the way for future advancements in the field. Her dedication to innovation exemplifies the vital role of inventors in driving technological progress.