Yutaka Kokaze

Title: Yutaka Kokaze: Innovator in Substrate Processing Technology

Introduction

Yutaka Kokaze is a notable inventor based in Susono, Japan. He has made significant contributions to the field of substrate processing technology, holding two patents that showcase his innovative approach to plasma generation and cleaning methods.

Latest Patents

Kokaze's latest patents include a "Method for Operating Substrate Processing Apparatus" and a "Dry Cleaning Method for Plasma Processing Apparatus." The first patent describes a method that stabilizes plasma generation to minimize particle generation during substrate processing. This involves initially supplying a rare gas into a vacuum chamber, applying voltage to generate plasma, and subsequently introducing a reaction gas to interact with the plasma. The second patent outlines a dry cleaning method that utilizes inductively-coupled plasma to remove contaminants from dielectric members in plasma processing apparatuses.

Career Highlights

Kokaze is currently employed at Ulvac, Inc., where he continues to develop and refine technologies related to plasma processing. His work has been instrumental in advancing the efficiency and effectiveness of substrate processing techniques.

Collaborations

Throughout his career, Kokaze has collaborated with esteemed colleagues such as Masahisa Ueda and Yoshiaki Yoshida. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Yutaka Kokaze's contributions to substrate processing technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in plasma processing methods, showcasing the importance of innovation in technology.