Company Filing History:
Years Active: 2016
Title: Yutaka Kodera: Innovator in Reflective Exposure Technology
Introduction
Yutaka Kodera is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of reflective exposure technology. With a focus on precision and accuracy, his work has paved the way for advancements in the manufacturing of reflective masks used in various applications.
Latest Patents
Kodera holds a patent for a "Mask blank for reflection-type exposure, and mask for reflection-type exposure." This innovative patent describes a reflective exposure mask blank that enables accurate exposure and transcription without light being reflected from areas other than the circuit pattern area. The reflective mask blank consists of a substrate that includes a multilayer reflective film, a protective film, an absorption film, and a reverse-surface conductive film made from indium tin oxide. The substrate is composed of various materials, including SiO, TiO, and oxides of several metals.
Career Highlights
Yutaka Kodera has made significant strides in his career, particularly through his work at Toppan Printing Co., Ltd. His expertise in reflective exposure technology has led to the development of advanced manufacturing processes that enhance the quality and efficiency of reflective masks.
Collaborations
Kodera has collaborated with notable colleagues, including Yo Sakata and Masato Kon. These partnerships have contributed to the successful development and implementation of innovative technologies in the field.
Conclusion
Yutaka Kodera's contributions to reflective exposure technology exemplify his dedication to innovation and precision. His patent and collaborative efforts continue to influence advancements in the industry.