Toppan Printing Co., Ltd.

Toppan Inc.

Yutaka Kodera

Masato Kon

Yo Sakata

Kazunori Seki

Naoya Takada

A technique that enables production of pellicle membranes that are better resistant to breakage when subjected to force exerted thereon in the thickness direction thereof and that have high transmittance to light. A pellicle membrane of the present invention includes a plurality of laminated layers, where at least one of the layers is provided with at least one hole having a width or diameter of 10 nm to 500 nm.

Pellicle membrane, pellicle, membrane, graphene sheet, and method for producing the graphene sheet

A reflective exposure mask blank and a reflective exposure mask are provided, and the mask enables accurate exposure and transcription without having light being reflected from areas other than a circuit pattern area. The reflective mask blank has, on a substrate (), a multilayer reflective film (), a protective film (), an absorption film (), and a reverse-surface conductive film (). A reverse-surface conductive film is formed from indium tin oxide. The substrate contains SiO, TiO, and at least one oxide of manganese (Mn), copper (Cu), cobalt (Co), chromium (Cr), iron (Fe), silver (Ag), nickel (Ni), sulfur (S), selenium (Se), gold (Au), and neodymium (Nd). The reflective mask is manufactured by forming a circuit pattern by selectively stripping the absorption film on the reflective mask blank, and forming a light-shielding frame by stripping the multilayer reflective film, the protective film, and the absorption film around the circuit pattern.

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Tokyo, Japan

Yutaka Kodera