Kyoto, Japan

Yuta Segawa

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Screen Holdings Co., Ltd.. Active years: 2024.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Yuta Segawa: Innovator in Substrate Processing Technology

Introduction

Yuta Segawa is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, particularly through his innovative patent. His work is recognized for its potential to enhance the efficiency and effectiveness of substrate processing methods.

Latest Patents

Yuta Segawa holds a patent for a substrate processing method and apparatus. This invention includes a chemical liquid nozzle that discharges a chemical liquid in a specific direction, inclined with respect to the upper surface of a substrate. The apparatus features a spray shield that directly opposes the substrate's surface, ensuring that the chemical liquid is applied precisely to the target position. The design allows for all portions of the chemical liquid discharge port to be positioned outside or on the edge of the shield surface, optimizing the processing method.

Career Highlights

Throughout his career, Yuta Segawa has been associated with Screen Holdings Co., Ltd., a company known for its advancements in imaging and semiconductor technologies. His work has contributed to the company's reputation as a leader in substrate processing solutions.

Collaborations

Yuta Segawa has collaborated with notable colleagues, including Toru Endo and Yuta Yamanouchi. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Yuta Segawa's contributions to substrate processing technology exemplify the impact of innovative thinking in the industry. His patent reflects a commitment to improving processing methods, showcasing his role as a key inventor in this field.

Profile summary based on public USPTO records.
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