Suwa, Japan

Yuta Horiuchi

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Seiko Epson Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuta Horiuchi. Retrieved from https://idiyas.com/inventor/yuta-horiuchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yuta Horiuchi - Innovator in Gas Separation Membranes

Introduction

Yuta Horiuchi is an inventor based in Suwa-shi, Japan. He is known for his work in the field of gas separation membranes. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

Horiuchi's recent patent applications include a gas separation membrane designed to selectively transmit carbon dioxide from a mixed gas containing both carbon dioxide and nitrogen. This membrane consists of a first layer and a second layer, which is composed of a compound that has the ability to separate carbon dioxide. The average thickness of the second layer is smaller than that of the first layer, and it meets specific performance parameters. Another application details a gas separation membrane that includes a first layer and a second layer, which is an inkjet coating made from compounds such as PET, POM, PLA, PDMS, cellulose, or a coupling agent.

Conclusion

Yuta Horiuchi's contributions to the field of gas separation membranes showcase his innovative spirit and potential for future advancements. His latest patent applications reflect a commitment to developing effective solutions for gas separation challenges.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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