Tokyo, Japan

Yusuke Nakatani

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Hitachi High-Tech Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yusuke Nakatani. Retrieved from https://idiyas.com/inventor/yusuke-nakatani-agjhha09

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Yusuke Nakatani: Innovator in Plasma Processing Technology

Introduction

Yusuke Nakatani is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique patent that enhances the efficiency of plasma processing apparatus.

Latest Patents

Nakatani holds a patent for an "Ion shield plate for plasma processing apparatus." This invention is designed to improve the performance and longevity of plasma processing equipment. It showcases his expertise and commitment to advancing technology in this specialized area.

Career Highlights

Yusuke Nakatani is currently employed at Hitachi High-Tech Corporation. His role at the company allows him to work on cutting-edge technologies and collaborate with other talented professionals in the field. His contributions have been instrumental in driving innovation within the organization.

Collaborations

Nakatani has worked alongside notable colleagues such as Kazuumi Tanaka and Masahiro Yamaoka. Their collaborative efforts have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Yusuke Nakatani is a dedicated inventor whose work in plasma processing technology has made a significant impact. His patent and collaborations reflect his commitment to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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