Hino, Japan

Yusuke Kawahara

This inventor holds 2 USPTO granted patents. Top assignee: Konica Corporation. Active years: 1997-2002.


% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1997-2002

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2 patents (USPTO):Explore Patents

Title: Yusuke Kawahara: Innovator in Photographic Technology

Introduction

Yusuke Kawahara is a notable inventor based in Hino, Japan. He has made significant contributions to the field of photographic technology, holding a total of 2 patents. His work focuses on developing innovative light-sensitive elements and methods for enhancing photographic emulsions.

Latest Patents

Kawahara's latest patents include a heat-developable light-sensitive element. This element comprises a non-light-sensitive organic silver salt and a light-sensitive silver halide. The average radius of the sphere of influence is from 0.35 µm to 10 µm when exposed to light ranging from 35 µJ/cm to 50 µJ/cm. The development process occurs using a developing drum at a temperature of 123±3 °C for a duration of 16±3 seconds. Another significant patent is a method for chemically sensitizing silver halide photographic emulsions using a selenium compound. This method outlines the steps necessary for effective sensitization.

Career Highlights

Kawahara is associated with Konica Corporation, a leading company in imaging and printing technologies. His work at Konica has allowed him to push the boundaries of photographic technology and contribute to advancements in the field.

Collaborations

Some of his notable coworkers include Tsukasa Ito and Tsuyoshi Mitsuhashi. Their collaborative efforts have further enhanced the innovative projects within the company.

Conclusion

Yusuke Kawahara's contributions to photographic technology through his patents and work at Konica Corporation highlight his role as a significant innovator in the field. His advancements continue to influence the industry and inspire future developments.

Profile summary based on public USPTO records.
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