Matsumoto, Japan

Yusuke Higuchi

This inventor holds 2 USPTO granted patents. Top assignee: Seiko Epson Corporation. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yusuke Higuchi. Retrieved from https://idiyas.com/inventor/yusuke-higuchi-owuik1ui

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Yusuke Higuchi: Innovator in Printing Technology

Introduction

Yusuke Higuchi is a notable inventor based in Matsumoto, Japan. He has made significant contributions to the field of printing technology. His innovative ideas have led to the development of a unique recording device that enhances the efficiency of printers.

Latest Patents

Higuchi holds a patent for a recording device that features a printer with a curved path for transporting media toward a line head. This device includes a transport roller pair that pinches the medium at a specific position, allowing for smooth transportation. The design also incorporates a gate portion that can switch between contact and retreat positions, ensuring optimal guidance of the medium during the printing process. He has 1 patent to his name.

Career Highlights

Yusuke Higuchi is currently employed at Seiko Epson Corporation, a leading company in the printing and imaging industry. His work at Epson has allowed him to focus on advancing printing technologies and improving the user experience.

Collaborations

Higuchi collaborates with his coworker, Keita Hanaoka, to further enhance their projects and drive innovation within their team.

Conclusion

Yusuke Higuchi's contributions to printing technology exemplify the spirit of innovation. His patent for a recording device showcases his commitment to improving the efficiency of printers. His work at Seiko Epson Corporation continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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