Tokyo, Japan

Yusuke Aida

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Tachi-S Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yusuke Aida. Retrieved from https://idiyas.com/inventor/yusuke-aida-thl4nz69

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Yusuke Aida: Innovator in Vehicle Seat Technology

Introduction

Yusuke Aida is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of vehicle seat technology. His innovative approach has led to the development of a unique seat-cover outer-skin material.

Latest Patents

Yusuke Aida holds a patent for a seat-cover outer-skin material, seat cover, and vehicle seat. This invention involves a seat cover that is formed of a skin material, which includes a surface material, a cushion material, and a backing material that are laminated together. The design features a stitch portion where the surface material and backing material are sewn together. Notably, the elongation percentage of the surface material is greater than that of the backing material when subjected to the same load.

Career Highlights

Yusuke Aida is currently employed at Tachi-S Co., Ltd., a company known for its advancements in automotive seating solutions. His work has been instrumental in enhancing the comfort and durability of vehicle seats.

Collaborations

Yusuke collaborates with Hiroshi Sekino, a fellow innovator in the field. Their combined expertise contributes to the ongoing development of innovative seating technologies.

Conclusion

Yusuke Aida's contributions to vehicle seat technology exemplify the importance of innovation in enhancing user experience. His patent reflects a commitment to improving automotive comfort and functionality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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