Yushin Sasaki

Title: Yushin Sasaki: Innovator in Transfer Mask Technology

Introduction

Yushin Sasaki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of transfer masks. His innovative work has led to advancements that enhance the quality and reliability of semiconductor devices.

Latest Patents

Yushin Sasaki holds a patent for a substrate for a transfer mask, which includes a first silicon layer made of monocrystalline silicon, a silicon oxide film with a thickness ranging from 0.2 to 0.8 µm, and a second silicon layer on top of the silicon oxide film. This invention addresses the issue of preventing transfer patterns from cracking or being destroyed due to stress from the silicon oxide film during the manufacturing process. The result is a defect-free transfer mask that significantly improves production efficiency.

Career Highlights

Sasaki is associated with Toppan Printing Co., Ltd., where he has been instrumental in advancing technologies related to semiconductor manufacturing. His expertise and innovative mindset have positioned him as a key figure in his field.

Collaborations

Yushin Sasaki has collaborated with notable colleagues, including Toshio Konishi and Akira Tamura. These partnerships have fostered an environment of innovation and have contributed to the success of their projects.

Conclusion

Yushin Sasaki's contributions to transfer mask technology exemplify the impact of innovation in the semiconductor industry. His work not only enhances manufacturing processes but also sets a standard for future developments in the field.