Tokyo, Japan

Yusaku Nanao

This inventor holds 1 USPTO granted patent. Top assignee: Taiyo Nippon Sanso Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yusaku Nanao. Retrieved from https://idiyas.com/inventor/yusaku-nanao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Yusaku Nanao: Innovator in Spatter Counting Technology

Introduction

Yusaku Nanao is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to the field of welding technology. His work focuses on developing methods that enhance efficiency and reduce costs in industrial applications.

Latest Patents

Yusaku Nanao holds a patent for a "Spatter counting method, computer program, and spatter counting device." This invention aims to provide a technique capable of counting spatters generated during welding by utilizing a portable terminal device equipped with an image capturing device. The method includes an image capturing step that records a moving image of an area with spatters and a counting step that counts the number of spatters in each still image.

Career Highlights

Nanao is associated with Taiyo Nippon Sanso Corporation, where he applies his expertise in welding technology. His innovative approach has led to significant advancements in the industry, particularly in the area of spatter management.

Collaborations

Yusaku Nanao has worked alongside talented colleagues such as Koji Ando and Tomoaki Sasaki. Their collaborative efforts contribute to the ongoing development of cutting-edge technologies in their field.

Conclusion

Yusaku Nanao's contributions to spatter counting technology exemplify his commitment to innovation in welding processes. His work not only enhances operational efficiency but also sets a benchmark for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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