Tokyo-to, Japan

Yurie Ota


Average Co-Inventor Count = 6.5

ph-index = 9

Forward Citations = 328(Granted Patents)


Location History:

  • Tokyo-To, JP (1998 - 2002)
  • Shinjuku, JP (2003)
  • Tokyo, JP (2005)
  • Shinjuku-Ku, JP (1999 - 2010)

Company Filing History:


Years Active: 1998-2010

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12 patents (USPTO):Explore Patents

Title: Yurie Ota: An Innovative Inventor in Tokyo

Introduction: Yurie Ota is a prolific inventor based in Tokyo-to, Japan, known for his significant contributions to materials science and engineering. With a remarkable portfolio of 12 patents, Yurie is at the forefront of innovation in creating advanced films and coatings that have diverse applications in the industry.

Latest Patents: Among Yurie Ota's most recent patents are two groundbreaking inventions. The first is a Hardcoat Film designed for plastic substrates, which features excellent suitability for printing and impressive hardness. This hardcoat minimizes the effects of substrate deformation on the coating, showcasing resistance to cracking and peeling. The formulation consists of a coating with organic components that include polymerizable functional groups and an inorganic filler, ensuring durability and performance for applications such as antireflection films and hologram labels.

His second patent is a Gas Barrier Film, which incorporates a composite film with a gas barrier layer featuring a laminated structure of metal oxide thin layers. It maintains a low coefficient of thermal expansion and humidity expansion, along with a high glass transition temperature. This innovative film has essential uses in displays, providing a reliable protective covering for display elements.

Career Highlights: Throughout his career, Yurie Ota has been associated with Dai Nippon Printing Co., Ltd., a company renowned for its commitment to innovation in printing technology and materials. His work continues to push the envelope of what is possible in the fields of coatings and films, contributing to various industrial applications.

Collaborations: Yurie has collaborated with notable coworkers, including Mitsuru Tsuchiya and the talented inventor Norinaga Nakamura, further strengthening his contributions to advancements in technology. These collaborations reflect the spirit of teamwork and shared innovation that characterizes the research and development environment at Dai Nippon Printing Co., Ltd.

Conclusion: Yurie Ota's extensive portfolio of patents and his innovative spirit place him among the leading inventors in his field. As he continues to develop new technologies that enhance our interaction with materials, his work will undoubtedly have lasting impacts in various industries, from consumer electronics to advanced manufacturing.

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