Yuri Lee

Title: Yuri Lee: Semiconductor Device Inventor

Introduction

Yuri Lee is an inventor based in Hwaseong, South Korea, whose patent work focuses on semiconductor and integrated circuit device structures. He is associated with Samsung Electronics, and his listed portfolio includes 2 patents.

Latest Patents

Lee’s recent patent work includes “Semiconductor Devices Having Wide and Narrow Source Drain Contacts.” The invention describes a semiconductor device with multiple gate structures and source/drain regions, using contacts of different widths and depths. The arrangement specifies differing distances between gate structures and positions the lower end of a narrow contact above the lower end of a wide contact.

Another patent, “Integrated Circuit Device Including Gate Contact,” describes an integrated circuit with active regions and gate structures across device and field areas. It features gate contacts positioned below the upper ends of their respective gate structures, with different minimum widths for contacts in the device and field areas.

Career Highlights

Lee’s listed inventions address structural design in semiconductor devices, including source/drain contacts and gate contacts. These designs reflect work on the layout and dimensions of components within integrated circuits.

Collaborations

Lee’s listed coworkers include Yoonyoung Jung and Deokhan Bae. His company affiliation is Samsung Electronics.

Conclusion

Yuri Lee’s patent portfolio highlights semiconductor device and integrated circuit designs, with particular attention to contact geometry and placement.