Miyoshi, Japan

Yuri Aoki

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Admatechs., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuri Aoki. Retrieved from https://idiyas.com/inventor/yuri-aoki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yuri Aoki: Inventor of Modified Metal Oxide Particle Technology.

Introduction

Yuri Aoki is an inventor based in Miyoshi, Japan, associated with Admatechs Co., Ltd. His work includes a patent for modified metal oxide particle material and a method for producing it.

Latest Patents

Aoki is credited with 1 patent, titled “Modified Metal Oxide Particle Material and Method for Producing Same.” The invention describes metal oxide particles bearing a surface functional group other than a phenyl group, with a phenyl-group-containing silicon compound adhered as a modifying material. It specifies measurable conditions for how the material responds to washing with methyl ethyl ketone, including limits on the carbon-content-to-surface-area ratio and the amount of modifying material removed.

Career Highlights

Aoki’s listed patent focuses on modifying metal oxide particle surfaces and defining properties that can be evaluated after solvent washing. The patent identifies Admatechs Co., Ltd. as his company.

Collaborations

Kenta Takei and Yusuke Watanabe are identified as Aoki’s coworkers. The available information does not specify their roles in the patent or whether they collaborated on the invention.

Conclusion

Yuri Aoki’s patent documents a specific approach to modifying metal oxide particles and evaluating the resulting material, reflecting his recorded inventive work at Admatechs Co., Ltd.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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