Yuqiong Dai

Title: Yuqiong Dai: Innovator in Photoresist Development

Introduction

Yuqiong Dai is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of photoresist technology. With a total of 2 patents, his work focuses on innovative methods that enhance the efficiency and effectiveness of photoresist processes in semiconductor manufacturing.

Latest Patents

Dai's latest patents include a method for a dry develop process of photoresist. This method involves developing a metal oxo photoresist using a non-wet process. The process includes providing a substrate with the metal oxo photoresist into a chamber, where the unexposed regions have a higher carbon concentration than the exposed regions. The method further involves flowing a gas into the chamber, which reacts with the unexposed regions to produce a volatile byproduct.

Another significant patent is for a fully self-aligned subtractive etch. This invention describes apparatuses and methods for providing fully self-aligned first metallization lines, vias, and second metallization lines. The design ensures that the vias are self-aligned to both the first and second metallization lines, enhancing the precision and reliability of the manufacturing process.

Career Highlights

Yuqiong Dai is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to push the boundaries of photoresist technology and contribute to advancements in semiconductor fabrication.

Collaborations

Dai has collaborated with several talented individuals in his field, including Madhur Sachan and Regina Germanie Freed. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Yuqiong Dai's contributions to photoresist technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the semiconductor industry. His innovative methods continue to shape the future of semiconductor manufacturing.