Beijing, China

Yunwei Li

This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Hefei Boe Display Technology Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yunwei Li. Retrieved from https://idiyas.com/inventor/yunwei-li-krpfdxxq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2020

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Yunwei Li

Introduction

Yunwei Li is a notable inventor based in Beijing, China. He has made significant contributions to the field of developing apparatuses, particularly in the area of printing technology. His innovative approach has led to the creation of a unique developing apparatus that enhances efficiency and effectiveness in its application.

Latest Patents

Yunwei Li holds 1 patent for his invention titled "Developing apparatus and developing method thereof." This developing apparatus features a developing mechanism and a heating mechanism, which includes multiple heating units. These heating units are strategically positioned above or below the developing mechanism, with each unit being independently disposed to optimize performance.

Career Highlights

Throughout his career, Yunwei Li has worked with prominent companies in the technology sector. He has been associated with Hefei Boe Display Technology Co., Ltd. and Boe Technology Group Co., Ltd. These experiences have allowed him to refine his skills and contribute to advancements in display technology.

Collaborations

Yunwei Li has collaborated with several talented individuals in his field. Notable coworkers include Kefang Wu and Wei Zhou, who have worked alongside him on various projects, further enhancing the innovation landscape.

Conclusion

Yunwei Li's contributions to the field of developing apparatuses demonstrate his commitment to innovation and technology. His patent reflects a significant advancement in the industry, showcasing his expertise and dedication to improving developing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…