This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Yunje Cho and Substrate Analysis Technology.
Introduction
Yunje Cho is an inventor based in Suwon, South Korea, associated with Samsung Electronics Ltd. His work includes a patent for a system designed to analyze patterned substrates through milling, depth measurement, and imaging.
Latest Patents
The provided information lists one patent for Cho: “Substrate Analysis System.” The invention combines a load-lock module for loading and unloading a substrate, a milling module that removes at least part of its pattern layer, a depth-measuring module, and an imaging module that captures a two-dimensional image of the analysis region. A control module circulates the substrate through these stages when the measured milling depth is shallower than the target depth. The milling module adjusts the ion-beam path according to a scanning profile based on the beam’s intensity map.
Career Highlights
Cho’s listed patent focuses on coordinating substrate preparation and inspection in a single analysis system. Its described process links ion-beam milling with depth measurement and image capture to examine a selected region of a patterned substrate.
Collaborations
The provided information names Jonghyeok Park and Kwangrak Kim as Cho’s coworkers. It does not specify their roles or describe particular joint projects.
Conclusion
Yunje Cho’s listed invention brings milling, depth measurement, and imaging together in a system for analyzing patterned substrates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile