Yongin-si, South Korea

Yunha Ryu

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yunha Ryu. Retrieved from https://idiyas.com/inventor/yunha-ryu-vmzojiby

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Yunha Ryu in Display Technology

Introduction

Yunha Ryu is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patent that enhances display performance.

Latest Patents

Yunha Ryu holds a patent for a "Display apparatus having low specular reflection and improved contrast ratio." This invention includes a light-emitting device layer with a first light-emitting device, a light control layer, and an optical functional layer designed to reduce near-infrared transmittance. The first light-emitting device emits first-color light in the near-infrared region, while the light control layer emits second-color light in the visible region. This technology aims to improve the overall viewing experience by enhancing contrast and reducing glare.

Career Highlights

Yunha Ryu is currently employed at Samsung Display Co., Ltd., a leading company in the display technology sector. His work at Samsung has allowed him to be at the forefront of advancements in display innovation.

Collaborations

Yunha Ryu collaborates with Junhan Lee, a fellow innovator in the field. Their partnership contributes to the development of cutting-edge display technologies.

Conclusion

Yunha Ryu's contributions to display technology through his innovative patent demonstrate his commitment to enhancing visual experiences. His work at Samsung Display Co., Ltd. continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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