This inventor holds 1 USPTO granted patent. Top assignee: Shanghai Longsheng Photoelectric New Material Co., Ltd.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Yung-Lung Wu: Innovator in PDLC Technology
Introduction
Yung-Lung Wu is a prominent inventor based in Jiangsu, China. He has made significant contributions to the field of photoelectric materials, particularly through his innovative work on polymer dispersed liquid crystal (PDLC) technology. His expertise and dedication have led to the development of a unique method for manufacturing PDLC membrane electrodes.
Latest Patents
Yung-Lung Wu holds a patent for a "Method for manufacturing PDLC membrane electrode, negative pressure platform and PDLC membrane." This patent outlines a systematic approach to creating a PDLC membrane electrode. The process involves placing a PDLC membrane on a negative pressure platform, activating the liquid crystal layer, and carefully cutting and tearing off specific layers to expose the electric conduction layer. This innovative method enhances the efficiency and effectiveness of PDLC technology.
Career Highlights
Wu is currently associated with Shanghai Longsheng Photoelectric New Material Co., Ltd., where he continues to advance research and development in photoelectric materials. His work has been instrumental in improving the manufacturing processes of PDLC membranes, contributing to the broader field of optoelectronics.
Collaborations
Yung-Lung Wu has collaborated with notable colleagues, including Pin-Hung Lee and Rui Sun. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of photoelectric materials.
Conclusion
Yung-Lung Wu's contributions to PDLC technology exemplify the impact of innovative thinking in the field of materials science. His patent and ongoing work at Shanghai Longsheng Photoelectric New Material Co., Ltd. highlight his commitment to advancing technology and improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile