Yung-Feng Chang

Title: Yung-Feng Chang: Innovator in Semiconductor Technology

Introduction

Yung-Feng Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on enhancing the performance and reliability of electronic devices through innovative designs and structures.

Latest Patents

One of Yung-Feng Chang's latest patents is related to electrostatic discharge (ESD) structures. This patent describes an ESD structure that includes a semiconductor substrate, a first epitaxy region with a first type of conductivity, a second epitaxy region with a second type of conductivity, and multiple semiconductor layers. These layers are strategically stacked to improve the device's resilience against electrostatic discharge. Another notable patent involves a method of forming an integrated circuit structure. This patent outlines a tap cell that includes a substrate, two wells with different dopant types, and doped regions that enhance the functionality of the integrated circuit.

Career Highlights

Yung-Feng Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves developing advanced semiconductor technologies that are crucial for modern electronic devices. His expertise and innovative approach have positioned him as a key player in the field.

Collaborations

Throughout his career, Yung-Feng Chang has collaborated with talented individuals such as Chun-Chia Hsu and Tung-Heng Hsieh. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Yung-Feng Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to shape the future of electronic devices, ensuring enhanced performance and reliability.