Location History:
- Feng-Yuan, TW (2002)
- Tai-Chung Hsien, TW (2003)
Company Filing History:
Years Active: 2002-2003
Title: Yung-Chung Lin: Innovator in Semiconductor Technology
Introduction
Yung-Chung Lin is a notable inventor based in Tai-Chung Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of semiconductor processes.
Latest Patents
Yung-Chung Lin's latest patents include a method of preventing silicide spiking and an ILD planarization method. The first patent describes a process where a polysilicon layer is formed on a semiconductor substrate, followed by a collimator physical vapor deposition (PVD) process to create a titanium nitride layer. A rapid thermal nitridation (RTN) process is then performed to enhance the structure of the titanium nitride layer, ultimately forming a silicide layer on the barrier layer. This method effectively prevents spike formation at the interface between the silicide layer and the polysilicon layer. The second patent provides a method for planarization of an inter layer dielectric in an EDRAM. This method involves defining a periphery circuit region and a memory array area on a semiconductor wafer, forming MOS transistors and capacitors, and utilizing a photoresist layer for etching processes. A chemical mechanical polishing process is then applied to achieve planarization of the inter layer dielectric.
Career Highlights
Yung-Chung Lin is currently employed at United Microelectronics Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices.
Collaborations
Some of his notable coworkers include Sun-Chieh Chien and De-Yuan Wu, who have collaborated with him on various projects within the semiconductor field.
Conclusion
Yung-Chung Lin's contributions to semiconductor technology through his patents and work at United Microelectronics Corporation highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor processes.