Company Filing History:
Years Active: 2000-2010
Title: Yung-Cheng Yu: Innovator in Low Dielectric Constant Films
Introduction
Yung-Cheng Yu is a prominent inventor based in San Jose, CA, known for his significant contributions to the field of semiconductor materials. With a total of 8 patents to his name, he has made remarkable advancements in the development of low dielectric constant films.
Latest Patents
His latest patents focus on the production of low dielectric constant films derived from silicon compounds that include silicon-carbon bonds. One notable patent describes a method and apparatus for depositing a low dielectric constant film through the reaction of an organo silane compound and an oxidizing gas. The resulting oxidized organo silane film exhibits excellent barrier properties, making it suitable for use as a liner or cap layer adjacent to other dielectric layers. Additionally, this film can serve as an etch stop or an intermetal dielectric layer for fabricating dual damascene structures. The oxidized organo silane films also provide outstanding adhesion between different dielectric layers. A preferred oxidized organo silane film is produced by the reaction of methyl silane, CHSiH, and NO.
Career Highlights
Yung-Cheng Yu is currently employed at Applied Materials, Inc., where he continues to innovate and develop new technologies in the semiconductor industry. His work has significantly impacted the efficiency and performance of electronic devices.
Collaborations
Throughout his career, Yung-Cheng has collaborated with notable colleagues, including Wai-Fan Yau and David Wingto Cheung, contributing to various projects and advancements in their field.
Conclusion
Yung-Cheng Yu's innovative work in low dielectric constant films has established him as a key figure in semiconductor technology. His patents and contributions continue to influence the industry and pave the way for future advancements.