Munich, Germany

YuNa Oh

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: YuNa Oh. Retrieved from https://idiyas.com/inventor/yuna-oh-uap0gfs7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2015

Loading Chart...
2 patents (USPTO):Explore Patents

Title: YuNa Oh: Innovator in Robotics

Introduction

YuNa Oh is a prominent inventor based in Munich, Germany. He has made significant contributions to the field of robotics, particularly in the development of innovative cleaning technologies. With a total of 2 patents, YuNa is recognized for his inventive spirit and dedication to enhancing everyday life through technology.

Latest Patents

YuNa Oh's latest patents include a robot cleaner and a damp cloth specifically designed for use with the robot cleaner. These inventions showcase his commitment to improving household efficiency and convenience through advanced robotics.

Career Highlights

YuNa currently works at Samsung Electronics Co., Ltd., a leading global technology company. His role at Samsung allows him to collaborate with some of the brightest minds in the industry, driving forward innovative solutions in consumer electronics.

Collaborations

Some of YuNa's notable coworkers include Felix Heck and Youna Kim, who contribute to a dynamic and creative work environment. Their collaboration fosters a culture of innovation and excellence within their projects.

Conclusion

In summary, YuNa Oh is an influential inventor whose work in robotics is paving the way for smarter home solutions. His patents reflect a deep understanding of technology and its potential to improve daily life.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…