Company Filing History:
Years Active: 1991
Title: Innovations of Yun-Sheng Hwang
Introduction
Yun-Sheng Hwang is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances the manufacturing process of MOS transistors.
Latest Patents
Hwang holds a patent titled "Process of making self-aligned contact using differential oxidation." This patent describes a method for forming a self-aligned oxide layer that covers conductive structures, such as MOS transistor gates, while exposing portions of the substrate, including source and drain regions. The process involves creating side wall spacers against the gates, applying refractory metal to the exposed surface, and heating the metal to form refractory silicide at contact points with the substrate. The unreacted refractory metal is then removed, and the exposed refractory silicide undergoes low-temperature wet oxidation. This method allows for faster oxide growth above highly doped gates compared to lightly doped source and drain regions. The subsequent etching of the differentially grown oxide layer exposes the source and drain regions while protecting the gate regions. Notably, this process eliminates the need for a mask, preventing misalignment and reducing the spacing between adjacent MOS transistor gates from 2.4 microns to 1.2 microns.
Career Highlights
Yun-Sheng Hwang is currently employed at Mos Electronics Corporation, where he continues to innovate in the semiconductor industry. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Hwang has collaborated with Nan-Hsiung Tsai, contributing to the development of innovative technologies in their field.
Conclusion
Yun-Sheng Hwang's contributions to semiconductor technology through his patent demonstrate his expertise and commitment to innovation. His work not only enhances manufacturing processes but also paves the way for future advancements in the industry.