This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Jusung Engineering Co., Ltd., Korea Advanced Institute of Science and Technology. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2020
Title: Innovations of Yun-Seong Lee in Plasma Technology
Introduction
Yun-Seong Lee is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of plasma technology, particularly in the development of apparatuses that enhance substrate processing. His innovative work has led to the filing of a patent that showcases his expertise and creativity.
Latest Patents
Yun-Seong Lee holds a patent for a plasma generating apparatus and a substrate processing apparatus. This invention includes a plurality of ground electrodes arranged inside a vacuum container, extending parallel to each other, with power electrodes positioned between them. The design features a constant distance between the ground and power electrodes, with the power electrodes tapered towards the substrate. These power electrodes are connected to an RF power source, and their height exceeds that of the ground electrodes in the direction facing the substrate. This innovative design aims to improve the efficiency and effectiveness of substrate treatment processes.
Career Highlights
Throughout his career, Yun-Seong Lee has worked with prestigious organizations, including the Korea Advanced Institute of Science and Technology and Jusung Engineering Co., Ltd. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research and development.
Collaborations
Some of his notable coworkers include Hong-Young Chang and Sang-Hun Seo. Their collaborative efforts have further advanced the research and applications of plasma technology.
Conclusion
Yun-Seong Lee's contributions to plasma technology through his innovative patent demonstrate his commitment to advancing the field. His work not only reflects his expertise but also has the potential to impact various applications in substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile