Suwon, South Korea

Yun Mo Yang

This inventor holds 1 USPTO granted patent. Top assignee: Ltc Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yun Mo Yang. Retrieved from https://idiyas.com/inventor/yun-mo-yang-maryn9rp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Yun Mo Yang in Display Manufacturing

Introduction

Yun Mo Yang is an accomplished inventor based in Suwon-si, South Korea. He has made significant contributions to the field of display manufacturing through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of manufacturing processes in the display industry.

Latest Patents

Yun Mo Yang holds a patent for a photoresist stripper composition specifically designed for manufacturing displays. This invention relates to an integrated photoresist stripper composition that can be utilized in every process involved in display manufacturing. The composition is particularly effective in removing modified photoresist after various processes, including hard bake, implant, and dry etch processes. Notably, it exhibits a corrosion inhibitory effect that is specialized for copper wiring pattern edge portions, which are often susceptible to corrosion following dry-etching.

Career Highlights

Yun Mo Yang is associated with Ltc Co., Ltd., where he continues to develop innovative solutions for the display manufacturing sector. His expertise and dedication to research have positioned him as a valuable asset in his field.

Collaborations

Yun Mo Yang has collaborated with notable colleagues, including Ho Sung Choi and Kyu Sang Kim, to further advance the technology and applications of his inventions.

Conclusion

Yun Mo Yang's contributions to the field of display manufacturing through his innovative patent demonstrate his commitment to enhancing industry standards. His work not only addresses current challenges but also paves the way for future advancements in display technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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