Yun Lin Jang

Title: Innovations of Yun Lin Jang in Photoresist Regeneration

Introduction

Yun Lin Jang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photoresist regeneration, which is crucial in various manufacturing processes, particularly in the semiconductor industry. His innovative approach has led to the development of a unique monitoring method, process, and system for photoresist regeneration.

Latest Patents

Yun Lin Jang holds 1 patent for his invention titled "Monitoring method, process and system for photoresist regeneration." This patent describes a method for adjusting the solid content and viscosity of photoresist through condensation under reduced pressure or dilution with a photoresist thinner. The process ensures that the final solid content and viscosity reach predetermined values, which are determined through a quantification equation. Additionally, the waste photoresist is filtered to remove pollution particles, resulting in regenerated photoresist.

Career Highlights

Yun Lin Jang is affiliated with the Industrial Technology Research Institute, where he has been instrumental in advancing research and development in his field. His work has not only contributed to the efficiency of photoresist regeneration but has also enhanced the sustainability of manufacturing processes.

Collaborations

Yun Lin Jang has collaborated with several esteemed colleagues, including Ching Chin Lai and Fang Cheng Chang. These collaborations have fostered a productive environment for innovation and have led to further advancements in their respective fields.

Conclusion

Yun Lin Jang's contributions to photoresist regeneration exemplify the importance of innovation in technology. His patented methods and processes are paving the way for more efficient and sustainable practices in the semiconductor industry.