The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Aug. 16, 2004
Ching Chin Lai, Hsinchu, TW;
Fang Cheng Chang, Chiayi, TW;
Ming En Chen, Tainan, TW;
Jung Hsiang Chu, Hsinchu, TW;
Kuang Ling Hsaio, Taipei, TW;
Yun Lin Jang, Hsinchu, TW;
Ching Chin Lai, Hsinchu, TW;
Fang Cheng Chang, Chiayi, TW;
Ming En Chen, Tainan, TW;
Jung Hsiang Chu, Hsinchu, TW;
Kuang Ling Hsaio, Taipei, TW;
Yun Lin Jang, Hsinchu, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A monitoring method for photoresist regeneration, a process and a system for the same are provided. In the photoresist regeneration process of the invention, the solid content and viscosity of photoresist are adjusted by condensation under reduced pressure or dilution with photoresist thinner until the final solid content and viscosity reach the predetermined values thereof obtained through the quantification equation of the invention and then the waste photoresist is caused to pass through filters for removing pollution particles contained therein, such that the regenerated photoresist is acquired.