Company Filing History:
Years Active: 2006
Title: Innovations by Ching Chin Lai in Photoresist Regeneration
Introduction
Ching Chin Lai is a notable inventor based in Hsinchu, Taiwan. She has made significant contributions to the field of photoresist regeneration, which is crucial in various manufacturing processes, particularly in the semiconductor industry. Her innovative approach has led to the development of a unique monitoring method, process, and system that enhances the efficiency of photoresist usage.
Latest Patents
Ching Chin Lai holds 1 patent for her invention titled "Monitoring method, process and system for photoresist regeneration." This patent describes a method for adjusting the solid content and viscosity of photoresist through condensation under reduced pressure or dilution with a photoresist thinner. The process ensures that the final solid content and viscosity meet predetermined values, which are determined using a quantification equation. Additionally, the waste photoresist is filtered to remove pollution particles, resulting in the acquisition of regenerated photoresist.
Career Highlights
Ching Chin Lai is affiliated with the Industrial Technology Research Institute, where she has been instrumental in advancing research and development in her field. Her work not only contributes to the efficiency of photoresist usage but also supports sustainable practices in the semiconductor manufacturing process.
Collaborations
Ching Chin Lai collaborates with esteemed colleagues such as Fang Cheng Chang and Ming En Chen. Their combined expertise fosters an environment of innovation and progress within their research initiatives.
Conclusion
Ching Chin Lai's contributions to the field of photoresist regeneration exemplify the impact of innovative thinking in technology. Her patent and ongoing research continue to influence the semiconductor industry positively.