Company Filing History:
Years Active: 2010
Title: Innovations of Yun-Biao Xin in Wafer Surface Detection
Introduction
Yun-Biao Xin is an accomplished inventor based in Palo Alto, California. He has made significant contributions to the field of wafer surface detection, particularly in non-semiconductor materials. His innovative approach has led to the development of a unique method for identifying scratches on wafer surfaces.
Latest Patents
Yun-Biao Xin holds a patent for "Systems and methods for detecting scratches on non-semiconductor wafer surfaces." This patent describes a method that utilizes a UV beam produced from a UV illumination source. The UV beam is directed onto the front surface of a wafer made of non-semiconductor material. The method is characterized by the fact that for scratches of a given material with a UV cutoff wavelength, over 90% of the spectral system response is at wavelengths below a specific threshold. The reflected beam resulting from the scattering of the UV beam is detected, allowing for the identification of scratches on the wafer's surface.
Career Highlights
Yun-Biao Xin has been associated with Crystal Technology, Inc., where he has applied his expertise in optical technologies. His work has been instrumental in advancing the methods used for wafer surface inspection, contributing to the quality assurance processes in semiconductor manufacturing.
Collaborations
Yun-Biao Xin has collaborated with notable colleagues, including Martin Andrew Smith and Ronald Charles Dwelle. Their combined efforts have fostered innovation and development in the field of wafer technology.
Conclusion
Yun-Biao Xin's contributions to the detection of scratches on non-semiconductor wafer surfaces exemplify his innovative spirit and technical expertise. His work continues to influence the industry and improve the standards of wafer inspection.