The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Jul. 16, 2008
Yun-biao Xin, Palo Alto, CA (US);
Martin Andrew Smith, San Jose, CA (US);
Ronald Charles Dwelle, Sunnyvale, CA (US);
Gerard Vurens, Palo Alto, CA (US);
Yun-Biao Xin, Palo Alto, CA (US);
Martin Andrew Smith, San Jose, CA (US);
Ronald Charles Dwelle, Sunnyvale, CA (US);
Gerard Vurens, Palo Alto, CA (US);
Crystal Technology, Inc., Palo Alto, CA (US);
Abstract
A method of detecting one or more scratches on a surface of a wafer made of a non-semiconductor material is provided. A UV beam is produced from a UV illumination source. The UV beam is incident on a front surface of the wafer. The UV beam being characterized that for scratches of a given material having a UV cutoff wavelength λ, over 90% of the spectral system response SSR is at wavelengths below μ−5 nm and expressed as: A reflected beam of scattering of the UV beam is detected in response to scratches on a surface of the wafer. The scattering is captured.