Otsu, Japan

Yumiko Isogai

This inventor holds 1 USPTO granted patent. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yumiko Isogai. Retrieved from https://idiyas.com/inventor/yumiko-isogai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Yumiko Isogai: Innovator in Clothing Simulation Technology

Introduction

Yumiko Isogai is a prominent inventor based in Otsu, Japan. She has made significant contributions to the field of clothing simulation technology. Her innovative work focuses on creating systems that enhance the fitting process of clothing on human models.

Latest Patents

Yumiko Isogai holds a patent for a clothing simulation apparatus, clothing simulation program, and clothing simulation method. This invention precisely determines clothing pressure to bring garments into tight contact with the human body. The apparatus divides a paper pattern model into multiple elements and imparts dynamic characteristics shown by a fabric model to each element. It deforms the paper pattern model by solving the motion equation of each element using a finite element method, allowing for virtual fitting of clothing to a human body model.

Career Highlights

Yumiko Isogai is associated with Toyo Boseki Kabushiki Kaisha, where she continues to develop her innovative ideas. Her work has garnered attention for its potential to revolutionize the fashion and clothing industries.

Collaborations

Yumiko collaborates with talented individuals such as Mariko Matsui and Kiyoshi Negishi, contributing to a dynamic team focused on advancing clothing simulation technologies.

Conclusion

Yumiko Isogai's contributions to clothing simulation technology exemplify her innovative spirit and dedication to improving garment fitting processes. Her work is paving the way for advancements in the fashion industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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