Kyoto, Japan

Yumi Hayakawa

This inventor holds 1 USPTO granted patent. Top assignee: Dainippon Screen Mfg. Co., Ltd.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yumi Hayakawa. Retrieved from https://idiyas.com/inventor/yumi-hayakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Yumi Hayakawa: Innovator in Pattern Matching Technology

Introduction

Yumi Hayakawa is a prominent inventor based in Kyoto, Japan. She has made significant contributions to the field of pattern matching technology. Her innovative work has led to the development of a unique apparatus and method that enhances the selection of pattern elements.

Latest Patents

Yumi holds a patent for an "Apparatus, method, and program for assisting in selection of pattern element for pattern matching." This invention includes a pattern-element extractor that extracts multiple pattern elements from a reference image. An input part allows an operator to select one of these elements as a reference pattern element. A distinguishability checker then verifies whether the selected element is distinguishable from others, ensuring its usability in pattern matching. This process helps prevent misrecognition of the reference pattern element, which is crucial for accurately detecting the position of a target image.

Career Highlights

Yumi is currently employed at Dainippon Screen Mfg. Co., Ltd., where she continues to innovate in her field. Her work has garnered attention for its practical applications in various industries.

Collaborations

Yumi collaborates with talented coworkers, including Hiroshi Sano and Atsushi Imamura, who contribute to her projects and enhance the overall innovation process.

Conclusion

Yumi Hayakawa's contributions to pattern matching technology exemplify her dedication to innovation. Her patent reflects her expertise and commitment to advancing technology in her field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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