Millburn, NJ, United States of America

Yuliy Rashkovsky

USPTO Granted Patents = 12 

Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 48(Granted Patents)


Location History:

  • New York, NY (US) (2017)
  • Millburn, NJ (US) (2013 - 2019)
  • Plainview, NY (US) (2019)

Company Filing History:


Years Active: 2013-2025

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12 patents (USPTO):Explore Patents

Title: Yuliy Rashkovsky: Innovator in Epitaxial Deposition Technology

Introduction

Yuliy Rashkovsky is a prominent inventor based in Millburn, NJ (US), known for his significant contributions to the field of epitaxial deposition technology. With a total of 12 patents to his name, Rashkovsky has made remarkable advancements that enhance the efficiency and effectiveness of substrate reactors.

Latest Patents

Among his latest innovations is the "Reactor with centering pin for epitaxial deposition." This invention features a substrate reactor that includes a vacuum chamber and a rotating tube designed to operate around a geometrical center axis. The substrate carrier, which forms a pocket for holding a substrate, is equipped with an aperture centrally located on its bottom surface. The centering pin, positioned along the axis of rotation, allows the substrate carrier to rotate independently, improving the precision of the deposition process. Another notable patent is the "Chemical vapor deposition wafer carrier with thermal cover," which further enhances the capabilities of wafer carriers in chemical vapor deposition applications.

Career Highlights

Yuliy Rashkovsky is currently associated with Veeco Instruments Inc., a company renowned for its innovative solutions in the semiconductor and nanotechnology sectors. His work at Veeco has positioned him as a key player in the development of advanced deposition technologies.

Collaborations

Throughout his career, Rashkovsky has collaborated with notable colleagues, including Alexander I Gurary and Mandar Deshpande. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Yuliy Rashkovsky's contributions to epitaxial deposition technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in semiconductor manufacturing and related technologies.

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