Yukio Ozaki

Title: Yukio Ozaki: Innovator in Substrate Processing Technology

Introduction

Yukio Ozaki is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor device manufacturing. With a total of 4 patents to his name, his work focuses on improving substrate processing technologies.

Latest Patents

Ozaki's latest patents include a substrate processing apparatus and a method of manufacturing semiconductor devices. One notable invention addresses the issue of delays during processing. When a step is delayed, the apparatus rapidly informs the operator of the delay. The substrate processing apparatus comprises a process system designed to process a substrate, a control unit that manages the process system, and a manipulation unit that monitors the progress of each step. If the time elapsed exceeds the allowable time for a step, the control unit sends an alarm message to notify the manipulation unit, terminates the hold state, and initiates a recovery action. Another patent describes a substrate processing apparatus that executes a first recipe for substrate processing. If a predetermined time elapses without a new substrate being carried into the process chamber, a second recipe is executed to maintain the process chamber.

Career Highlights

Yukio Ozaki is currently employed at Hitachi Kokusai Electric Inc., where he continues to innovate in the field of semiconductor technology. His work has been instrumental in enhancing the efficiency and reliability of substrate processing.

Collaborations

Some of his notable coworkers include Satoru Takahata and Reizo Nunozawa, who have collaborated with him on various projects.

Conclusion

Yukio Ozaki's contributions to substrate processing technology have made a significant impact on the semiconductor industry. His innovative patents reflect his commitment to advancing technology and improving manufacturing processes.